We provide environmentally friendly alternatives to harsh and costly chemicals traditionally used for various industrial processes. The Ozone Water Supply System is the perfect solution for manufacturers seeking an efficient, cost-effective, and sustainable functional water supply system.
Our innovative system utilizes ozone to activate the water, providing a natural way to purify and disinfect without harsh chemicals or wasteful filtering systems. With our ozone technology, you can easily reduce contaminant levels and clean the surfaces of your equipment and facilities. Plus, our ozone system is designed to be modular, allowing for easy installation and maintenance.
Ozone water is highly effective in removing organic, metal, and particle contamination on surfaces. This creates high-purity surfaces for industrial applications.
This state-of-the-art ozone water system has a high yield of ozone supported by a concentration control system. This can help control the ozone concentration according to the process requirements. The ozone water supply system comes equipped with the ability to convert ozone water into oxygen and water. This reduces the impact on the environment by eliminating harmful wastewater.
Description | Value |
---|---|
Width | 1,000 mm |
Length | 1,500 mm |
Height | 2,000 mm |
Weight | 400 kg |
Our ozone water supply system has a compact design that can be easily integrated into most existing industrial settings. This can help reduce the implementation costs while updating your manufacturing process.
Technical Specifications
Industrial Applications
Removing Organic Residue
Our system dissolves ozone gas (O3) in ultra-pure deionized (DI) water to produce ozonated DI water (aka DIO3). Ozone water is highly active and degrades organic contaminants effectively, leaving the surfaces extremely clean. The contaminant removal efficiency of DIO3 depends partially on the ozone concentration.
Removing
Metals
Our ozone water system can be combined with other chemicals to remove metal residuals on surfaces. Acids such as hydrofluoric (HF) and hydrochloric (HCl) can be combined with DIO3 either as sprays or immersion baths for metal residual removal. This is safer and consumes less than 60% of chemicals used in conventional methods.
Removing
Photoresist
DIO3 has applications in the semiconductor industry, especially in the wet-cleaning process of wafers. It removes photoresists from wafer surfaces effectively without leaving by-products. The ozone concentration in our system can be adjusted to control the photoresist removal rate as per the requirements.
Explore our other functional water systems, each providing unique properties to cater to distinct needs.
Ammonia Hydrogen Water Supply System
Ozone Water Destruction System
FAQs
Aqueous ozone, or ozonated water, has ozone added to it. Research shows that aqueous ozone is better than chlorine at killing viruses and bacteria. It is also used in industrial cleaning processes because it reduces the need for other chemicals. It has been used in commercial water treatment for a century.
The use of DIO3 water has been proven effective in getting rid of harmful metals such as Cu and Ag from wafer surfaces. These metals are classified as noble metals because they have a higher electronegativity than Si and efficiently react with silicon by oxidizing it on wafer surfaces.