Advanced Hydrogen & Ozone Generator Solutions for Semiconductor Cleaning & Industrial Purity
At Inquivix Technologies, we specialize in functional water and gas generator solutions that power next-generation semiconductor manufacturing, industrial cleaning, and ultrapure water treatment systems. With a direct partnership with the inventor and industry leader in hydrogen and ozone technology, we provide unmatched purity, efficiency, and reliability in H₂ and O₃ generation systems.
Our 99.999% purity hydrogen and ozone solutions are designed to:
Enhance wafer surface preparation & precision cleaning
Reduce chemical contamination & improve environmental sustainability
Deliver high-purity water and gas supply solutions for critical industries
Industry-Leading Products for Semiconductor &
Industrial Applications
Hydrogen Water Generators
Ultrapure H₂ water for semiconductor & wafer processing
Ozone Water Generators
High-purity ozone water for eco-friendly cleaning
Hydrogen Gas Generators
Reliable H₂ gas supply for critical industrial applications
Ozone Gas Generators
Advanced oxidation technology for precision cleaning
Introduction to Inquivix Technologies & Our Industry Leadership
At Inquivix Technologies, we are more than just a distributor—we are an industry leader in functional water and gas generation systems for semiconductor fabs, industrial processing, and advanced cleaning applications.
With a direct partnership with the inventor of hydrogen and ozone technology, we provide cutting-edge hydrogen water generators, ozone water generators, hydrogen gas generators, and ozone gas generators that deliver unmatched purity, efficiency, and performance.
Why Inquivix Technologies?
Direct Partnership with the Innovator of Functional Water & Gas Systems
Industry-Leading Purity Standards (99.999% H₂ & O₃ Solutions)
Proven Performance in Semiconductor, Medical & Industrial Applications
Customizable Solutions for Unique Facility Needs
Unlike generic suppliers, we focus on precision-engineered solutions tailored for high-purity cleaning, oxidation, and contamination control.
Engineered for Semiconductor & Industrial Applications
Our hydrogen and ozone generator systems are designed to:
Backed by Technology & Industry Expertise
With decades of industrial and semiconductor technology expertise, Inquivix Technologies provides a seamless, turnkey solution for your functional water and gas needs.
Learn how we are redefining purity in semiconductor processing.
Our Core Solutions
Hydrogen & Ozone Generators
At Inquivix Technologies, we specialize in cutting-edge hydrogen and ozone generation systems engineered for semiconductor manufacturing, industrial processing, and ultrapure water treatment. Our solutions provide 99.999% purity, unmatched efficiency, and seamless integration into your existing infrastructure.
Hydrogen & Ozone Generators for
High-Purity Applications
Our innovative H₂ and O₃ solutions are designed to support the most demanding industries, offering superior cleaning, oxidation, and contamination control while reducing environmental impact.
Backed by Technology & Industry Expertise
Every facility has unique process requirements, which is why our hydrogen and ozone generators are engineered for flexibility, scalability, and seamless integration into semiconductor fabs, industrial plants, and ultrapure water systems.
Proven Performance in Semiconductor & Industrial Applications
Wafer surface cleaning & passivation
Oxidation & advanced material processing
Chemical-free cleaning for ultra-pure water treatment
H₂ & O₃ supply for industrial, medical, and research labs
Why Hydrogen & Ozone?
The Future of Clean & Sustainable Technology
As industries move toward higher purity standards and eco-friendly solutions, hydrogen, and ozone-based cleaning are rapidly replacing traditional chemical processes in semiconductor manufacturing, industrial cleaning, and ultrapure water treatment.
At Inquivix Technologies, we are driving this transformation with cutting-edge hydrogen and ozone generator solutions that offer superior cleaning power, reduced chemical dependency, and enhanced process efficiency.
Hydrogen & Ozone vs. Traditional
Chemical Cleaning
Conventional semiconductor and industrial cleaning methods rely on harsh chemicals like HF, HCl, and SC1 that pose contamination risks, high operational costs, and environmental concerns. Hydrogen and ozone-based cleaning provide a safer, more effective alternative.
The future of semiconductor cleaning is chemical-free. Discover why the world’s leading fabs are switching to hydrogen and ozone.
Key Benefits of Hydrogen & Ozone Cleaning
Technology
Leading the Future of Semiconductor Cleaning & Industrial Purity
At Inquivix Technologies, we are committed to driving the transition to hydrogen and ozone-based cleaning by offering:
Upgrade to hydrogen and ozone cleaning today and experience the future of precision cleaning.
Case Studies & Industry Success
Real-World Impact of Hydrogen & Ozone Generators
At Inquivix Technologies, we don’t just provide hydrogen and ozone solutions—we deliver proven results that drive efficiency, purity, and sustainability in semiconductor fabs, ultrapure water systems, and industrial applications.
Leading semiconductor manufacturers, research labs, and industrial facilities worldwide trust our functional water and gas systems.
Case Study:
Hydrogen Water Generator in a Leading Semiconductor Fab
A major semiconductor fab faced challenges with chemical residues affecting wafer yield. After integrating our hydrogen water generator, they achieved:
• 36% reduction in particle contamination
• Zero metallic contamination detected using VPD ICPMS & TXRF analysis
• Increased wafer yield & reduced chemical consumption
Case Study:
Ozone Water vs. Traditional Chemicals in Industrial Cleaning
A manufacturer transitioning to eco-friendly cleaning methods replaced HF-based etching with our ozone water generator. The results:
• Eliminated hazardous waste disposal costs
• Improved surface oxidation efficiency by 22%
• Safer working environment with reduced chemical exposure.
Performance Testing:
Hydrogen & Ozone for Wafer Cleaning
Our hydrogen & ozone cleaning process was tested under semiconductor fab conditions, showing:
• Particle removal efficiency of >99.9% at 0.12µm defectivity level
• H₂/DIW-treated wafers showed lower contamination vs. standard DIW cleaning
• Ozone water-treated wafers demonstrated superior oxidation uniformity.
Why Top Semiconductor & Industrial Companies Choose
Inquivix Technologies
Proven Results
Backed by real-world case studies & lab-tested performance
Certified Purity
99.999% hydrogen & ozone quality for precision applications
Custom Solutions
Tailored H₂ & O₃ generation systems for specific process needs
Seamless Integration
Compatible with leading semiconductor & industrial equipment
Ready to Transform Your Process with Hydrogen & Ozone?
Join the leading semiconductor fabs, industrial facilities, and research labs switching to high-purity hydrogen and ozone solutions.
Additional Products
Industrial Aluminum Solutions
While Inquivix Technologies is the leading supplier of hydrogen and ozone generation systems, we also provide high-quality industrial aluminum products for various applications. Our expertise in the nonferrous metals industry allows us to deliver premium aluminum solutions for manufacturers, industrial processes, and supply chains.
Our Aluminum Product Offerings
Aluminum Sheets & Coils
High-strength, corrosion-resistant aluminum sheets and coils for manufacturing, construction, and industrial applications.
Aluminum Ingots & Scrap
Premium-grade aluminum ingots and recycled aluminum scrap for sustainable metal processing.
Specialized Industrial Aluminum Solutions
Custom aluminum products tailored to aerospace, automotive, and electronics industries.
Why Work With Inquivix Technologies for Aluminum?
Why Choose Inquivix Technologies?
Trusted by global semiconductor fabs, research labs, and industrial manufacturers.