Advanced Hydrogen Water Technology for High-Purity Applications

In the semiconductor and high-tech manufacturing industries, contamination control is critical to achieving superior product quality and performance. As fabrication processes become more sophisticated, manufacturers require ultra-pure cleaning solutions to ensure defect-free wafer production.

The Inquivix Technologies Hydrogen Water Generator is an advanced functional water system designed to meet these stringent requirements. Our high-efficiency hydrogen infusion technology provides a stable, ultra-pure hydrogen water supply, optimized for:

Semiconductor wafer cleaning to remove microscopic contaminants.

Surface passivation & oxidation prevention to protect materials from degradation.

Precision manufacturing processes requiring high-purity functional water.

Unlike conventional cleaning methods that rely on chemical-based treatments, hydrogen water offers an eco-friendly, high-performance alternative. By reducing oxidation and improving particle removal efficiency, our system enhances yield rates and overall process reliability in semiconductor fabrication, medical industries, and advanced manufacturing.

Table of Contents

  • Advanced Hydrogen Water Technology for High-Purity Applications
  • Why Hydrogen Water is Transforming Semiconductor Cleaning
  • Why Industry Leaders Choose Our Hydrogen Water Generator
  • The Growing Role of Hydrogen Water in Semiconductor Manufacturing
  • Key Applications of Our Hydrogen Water Generator
  • How Hydrogen Water Improves Semiconductor Wafer Cleaning Efficiency
  • How Our Hydrogen Water Generator Works
  • Hydrogen Water vs. Traditional Chemical Cleaning: A Performance Comparison
  • Why Semiconductor Manufacturers Are Transitioning to Hydrogen Water
  • Key Technical Advantages of Our Hydrogen Water Generator
  • Case Study: A Semiconductor Fab’s Shift to Hydrogen Water Cleaning Why Inquivix Technologies?

Why Hydrogen Water is Transforming Semiconductor Cleaning

Minimizes Oxidation & Surface Defects
Traditional cleaning chemicals can lead to unwanted oxidation, which affects the integrity of semiconductor wafers. Hydrogen water neutralizes oxidative reactions, ensuring a pristine wafer surface.

Superior Contaminant Removal
The precise hydrogen-enriched water infusion enables effective particle detachment, reducing microscopic debris that can cause circuit failures in semiconductor devices.

Seamless Integration with Ultra-Pure Water (UPW) Systems
Hydrogen water generators can be directly integrated into existing UPW pipelines, allowing automated, high-purity water supply without requiring significant infrastructure changes.

Eco-Friendly & Sustainable Solution
Unlike acid-based cleaning agents, hydrogen water is a green alternative, reducing the need for hazardous chemical waste disposal while maintaining superior wafer-cleaning efficiency.

The adoption of hydrogen water technology is rapidly increasing in semiconductor fabs due to its ability to enhance process stability, improve wafer quality, and lower operating costs. As a leading supplier of hydrogen & ozone water systems, Inquivix Technologies is committed to advancing semiconductor cleaning technology with innovative, high-performance solutions.

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Why Industry Leaders Choose Our Hydrogen Water Generator

As semiconductor manufacturing evolves, companies require ultra-pure cleaning solutions that enhance yield rates, reduce contamination, and optimize operational efficiency. The Inquivix Technologies Hydrogen Water Generator is engineered to meet these demands, delivering stable, high-purity hydrogen water for semiconductor and industrial applications.

Here’s why leading semiconductor fabs, industrial manufacturers, and precision laboratories trust our hydrogen water system:

Proven Ultra-Pure Hydrogen Water Production

Our system ensures a consistent supply of ultra-pure hydrogen water with precise H₂ concentration control (1.0–2.0 ppm), making it ideal for wafer cleaning, oxidation prevention, and surface passivation.

  • Maintains semiconductor-grade purity levels for advanced fabrication.
  • Minimizes oxidation risks during wet process applications.
  • Reduces surface defects that can impact circuit integrity.

Proven Ultra-Pure Hydrogen Water Production

Our system ensures a consistent supply of ultra-pure hydrogen water with precise H₂ concentration control (1.0–2.0 ppm), making it ideal for wafer cleaning, oxidation prevention, and surface passivation.

  • Maintains semiconductor-grade purity levels for advanced fabrication.
  • Minimizes oxidation risks during wet process applications.
  • Reduces surface defects that can impact circuit integrity.

Seamless Integration with Ultra-Pure Water (UPW) Systems

Designed for flexibility and compatibility, our hydrogen water generator integrates seamlessly into existing UPW pipelines, ensuring a smooth transition to functional water-based cleaning.

  • Modular system design enables easy scaling for high-volume semiconductor production.
  • Automated hydrogen injection technology ensures stable H₂ levels in real-time.
  • Plug-and-play configuration for minimal disruption to current wet processing tools.

Precision Hydrogen Dosing Technology for Enhanced Performance

Hydrogen concentration fluctuations can compromise wafer cleanliness. Our system features high-precision hydrogen dosing, ensuring stable and uniform H₂ distribution throughout the process.

  • Micro-level hydrogen injection control optimizes wafer cleaning and passivation.
  • Eliminates variations in hydrogen concentration, preventing inconsistencies in manufacturing.
  • Self-monitoring and real-time adjustments maintain process stability for high-yield semiconductor production.

Eco-Friendly & Cost-Efficient Cleaning Alternative

Unlike traditional acid-based wafer cleaning methods, which produce hazardous byproducts, our hydrogen water solution is:

  • Chemical-free – No corrosive agents or harmful residues.
  • Environmentally sustainable – Reduces reliance on chemical cleaning solvents.
  • Lower operational costs – Minimizes waste disposal fees and chemical purchases.

Backed by Korean Engineering
& Innovation

At Inquivix Technologies, we leverage Korean engineering excellence to develop cutting-edge hydrogen water systems that:

  • Exceed global semiconductor industry standards for purity and reliability.
  • Undergo rigorous quality testing to ensure consistent performance in high-tech manufacturing.
  • Offer long-term operational stability with automated system diagnostics and low-maintenance components.

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The Growing Role of Hydrogen Water in Semiconductor Manufacturing

The semiconductor industry is transforming rapidly, with advanced node technologies (3nm, 5nm, and beyond) requiring more precise contamination control and ultra-pure cleaning solutions. As traditional chemical-based cleaning methods face limitations in purity and environmental compliance, hydrogen water treatment is emerging as a superior alternative.

Three key trends drive this shift:

1. Semiconductor Manufacturers Are Moving Away from Chemical-
Based Cleaning

Traditional cleaning methods rely on strong acids, alkaline solutions, and oxidizing agents that pose risks, such as:

  • Unwanted oxidation leading to wafer degradation.
  • Residual chemical contamination impacting device performance.
  • High waste disposal costs due to strict environmental regulations. 


Hydrogen water provides a gentler yet highly effective alternative, ensuring superior surface purity while reducing environmental impact.

Leading semiconductor fabs are now integrating functional water-based cleaning technologies into their production lines to enhance efficiency and sustainability.

2. Hydrogen Water Enhances Yield Rates & Process Stability

Yield loss due to wafer defects is a major concern in semiconductor fabrication. Even microscopic contaminants can cause electrical failures, leading to scrap losses and reduced production efficiency.

By adopting hydrogen water cleaning, semiconductor manufacturers can achieve:

  • Lower defect rates – Prevents oxidation-induced surface damage.
  • Enhanced wafer cleanliness – Hydrogen-enriched water dissolves micro-contaminants more effectively than DI water alone.
  • Stable manufacturing processes – Hydrogen water minimizes process variability, ensuring uniform quality control across production batches. 


In recent trials, semiconductor fabs using hydrogen water for wet processing reported up to 12% improvement in yield rates, demonstrating its effectiveness over traditional methods.

3. Hydrogen & Ozone Functional Water Systems Are Becoming Industry Standards

Hydrogen water is not the only functional water technology transforming semiconductor manufacturing. Ozone water cleaning is also widely used to remove photoresist stripping and organic residue.

Together, these two technologies are setting new cleanroom standards for:

  • Wafer surface passivation – Protecting sensitive semiconductor layers from degradation.
  • Particle-free processing – Reducing defects that impact electrical conductivity.
  • Next-gen semiconductor nodes – Essential for sub-5nm manufacturing, where precision cleaning is critical.

Semiconductor fabs are increasingly adopting hybrid cleaning systems that combine hydrogen water with ozone water to achieve next-level purity and defect reduction.

Eco-Friendly, High-Performance Cleaning Solutions for Precision Manufacturing

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Key Applications of Our Hydrogen Water Generator

Hydrogen water is revolutionizing contamination control and ultra-pure cleaning across various high-tech industries. The Inquivix Technologies Hydrogen Water Generator is engineered to deliver stable, ultra-pure hydrogen water, ensuring superior performance in critical applications such as semiconductor manufacturing, medical research, and industrial processing.

Here’s how industry leaders are integrating hydrogen water technology into their operations:

 1. Semiconductor Wafer Cleaning

Challenge:
Micro-contaminants on wafers can lead to electrical defects and circuit failures, impacting production yield. 


Solution:
Hydrogen-enriched water enhances particle removal and surface treatment, ensuring: 


  • Effective elimination of nanoscale contaminants that traditional DI water alone cannot remove.
  • Non-corrosive, oxidation-free cleaning compared to acid-based solutions.
  • Higher process stability in wet cleaning and surface conditioning applications.

Why It Matters:
With advanced sub-5nm semiconductor nodes, hydrogen water is becoming a standard for ultra-precision wafer cleaning.

 2. Oxidation Prevention & Surface Passivation

Challenge:
Oxidation during semiconductor processing can lead to surface degradation, affecting the electrical performance of chips.

Solution:
Hydrogen water effectively neutralizes free radicals, preventing unwanted oxidation in:

  • Thin-film deposition – Protects ultra-thin layers during manufacturing.
  • Surface passivation – Reduces defects in semiconductor and display panel production.
  • CMP (Chemical Mechanical Planarization) post-cleaning – Improves surface uniformity.

Industry Trend:
Top fabs are moving away from aggressive oxidation-based cleans to hydrogen water for better yield rates and lower material stress.

3. Ultra-Pure Water (UPW) Treatment & Functional Water Systems

Challenge:
Standard DI (deionized) water systems struggle to maintain stable hydrogen concentrations, leading to inconsistent cleaning performance.

Solution:
The Inquivix Hydrogen Water Generator integrates seamlessly with UPW systems to:

  • Ensure consistent hydrogen infusion for high-purity processes.
  • Reduce dissolved oxygen (DO) levels to prevent oxidation.
  • Optimize wafer cleaning, etching, and stripping steps with precise hydrogen dosing.

Why It’s Crucial:
As fabs move toward fully automated wafer processing, UPW-integrated hydrogen water systems are becoming essential for contamination control.

4. Medical & Pharmaceutical Applications

Challenge:
Sterileness and purity are paramount in the pharmaceutical and medical industries. Contaminants in biological research, drug manufacturing, and laboratory environments can compromise results. 


Solution:
Hydrogen water is now being adopted in:

  • Biomedical research facilities – Ensuring contamination-free environments for precision testing.
  • Drug formulation & pharmaceutical manufacturing – Reducing oxidative stress in certain medical applications.
  • Sterile cleaning processes in hospitals & laboratories – Providing a non-toxic alternative to chemical sanitizers.

Future Outlook:
With increasing regulatory requirements for cleanroom environments, hydrogen water systems are expected to gain broader adoption in the pharmaceutical and biotech industries.

5. Industrial Processing & Chemical Manufacturing

Challenge:
Many industrial processes rely on high-purity water for chemical synthesis, electronics manufacturing, and advanced material production. Impurities can cause process inefficiencies and material failures.

Solution:
Hydrogen water offers a cost-effective, high-performance solution for:

  • Precision cleaning in optics, aerospace, and microelectronics.
  • Hydrogen-assisted catalytic reactions for industrial applications.
  • Reduction of oxidation-sensitive materials in chemical processing.

Future Outlook:
With increasing regulatory requirements for cleanroom environments, hydrogen water systems are expected to gain broader adoption in the pharmaceutical and biotech industries.

Revolutionize Your Cleaning Process with the Stable

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How Hydrogen Water Improves Semiconductor Wafer Cleaning Efficiency

Semiconductor wafer cleaning is one of the most critical steps in fabrication, directly impacting yield rates, defect density, and overall production efficiency. As manufacturers push toward smaller nodes (5nm, 3nm, and beyond), contamination control becomes more challenging, requiring advanced cleaning solutions like hydrogen water technology to meet ultra-purity standards.

Here’s how hydrogen water enhances wafer cleaning efficiency compared to traditional methods:

1. Minimizes Oxidation & Surface Degradation

Problem

Traditional chemical-based cleaning agents (e.g., acids, oxidizers) can cause unintended oxidation, leading to surface roughness and material degradation.

Oxidation can alter semiconductor properties, impacting transistor performance and chip reliability.

Solution

Hydrogen water acts as a reducing agent, neutralizing oxidation without the need for harsh acids.

Ensures smoother, defect-free wafer surfaces, improving device longevity and performance.

Hydrogen-based functional water is increasingly used in post-CMP cleaning and wet etching to stabilize wafer surfaces before critical deposition steps.

2. Enhances Particle Removal & Surface Cleaning

Problem

  • Semiconductor wafers accumulate micro-contaminants, including particles, organic residues, and chemical byproducts.
  • DI (deionized) water alone lacks the chemical properties to remove these contaminants effectively.

Solution

  • Hydrogen-enriched water improves particle detachment efficiency, allowing for more effective cleaning at the nanoscale level.
  • Reduces static charge attraction, preventing particles from reattaching to the wafer surface.
  • Works synergistically with UPW (Ultra-Pure Water) and ozone cleaning to provide a comprehensive contamination control solution.

Semiconductor fabs using hydrogen water reported up to 30% improvement in defect reduction, leading to higher production yields.

3. Stabilized Hydrogen Injection for Process Consistency

Problem

  • Traditional cleaning methods require frequent chemical dosing adjustments, leading to process variability.
  • Inconsistent chemical concentrations can introduce cleaning inefficiencies and batch-to-batch variations.

Solution

  • The Inquivix Technologies Hydrogen Water Generator delivers a precisely controlled H₂ concentration (1.0–2.0 ppm), ensuring consistent cleaning performance.
  • Integrated real-time monitoring systems adjust hydrogen levels dynamically, adapting to process demands.

Fabs can maintain higher production uniformity by eliminating process inconsistencies and reducing the risk of yield loss.

4. Reduces Chemical Dependency & Improves Sustainability

Problem

  • Acidic and solvent-based cleaning methods generate chemical waste, requiring costly disposal and environmental compliance measures.
  • Regulatory agencies worldwide are imposing stricter environmental guidelines on semiconductor fabs.

Solution

  • Hydrogen water eliminates the need for corrosive chemicals, offering a green, eco-friendly alternative.
  • Reduces waste treatment costs, making it a cost-effective long-term investment.
  • Supports corporate sustainability initiatives, aligning with the semiconductor industry’s shift toward greener manufacturing processes.

Switching to functional water cleaning can reduce chemical waste output by 50%, lowering operational costs and carbon footprint.

Protect Your Materials, Prevent Oxidation, and Enhance Process Efficiency with the Inquivix Technologies Hydrogen Water Generator.

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How Our Hydrogen Water Generator Works

The Inquivix Technologies Hydrogen Water Generator is designed to deliver high-purity hydrogen water through a precisely controlled and fully automated process. Our advanced hydrogen infusion system ensures that semiconductor manufacturers achieve stable, ultra-pure cleaning solutions without the inefficiencies of traditional chemical-based methods.

Here’s how our cutting-edge hydrogen water technology works:

Hydrogen Water vs. Traditional Chemical Cleaning: A
Performance Comparison

Semiconductor manufacturers have long relied on chemical-based cleaning methods such as acidic and alkaline solutions, oxidizing agents, and DI (deionized) water rinsing to remove contaminants from wafers. However, as chip geometries shrink and environmental regulations tighten, these traditional methods present significant drawbacks, including surface degradation, oxidation risks, and high operational costs.

Hydrogen water cleaning is emerging as a superior alternative, offering high-purity cleaning with fewer chemical dependencies. Below is a direct comparison of hydrogen water vs. traditional chemical-based cleaning methods in semiconductor applications.

Hydrogen water not only enhances wafer cleaning efficiency but also reduces process variability, operational costs, and environmental impact—all critical factors for high-volume semiconductor fabs. 


Next-Generation Contamination Control

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Why Semiconductor Manufacturers Are
Transitioning to Hydrogen Water

Regulatory & Environmental Compliance

  • Governments and semiconductor industry bodies are tightening restrictions on chemical waste disposal, pushing fabs to adopt eco-friendly functional water solutions.
  • Hydrogen water eliminates chemical-intensive etching solutions, reducing regulatory burdens while maintaining process purity.

Advanced Node Technology (3nm & Beyond) Requires Cleaner Surfaces

  • As chip dimensions shrink, surface roughness & micro-contaminants from chemical cleaners can directly impact electrical performance.
  • Hydrogen water provides a non-reactive, highly stable cleaning alternative, ensuring optimal surface conditions for next-generation semiconductor devices.

Cost-Effective Alternative with Long-Term ROI

  • Hydrogen water systems require lower maintenance than chemical-based alternatives, leading to lower total cost of ownership (TCO) over time.
  • Fabs implementing hydrogen water cleaning report yield improvements of 12–30%, increasing profitability.

Key Technical Advantages of Our Hydrogen Water Generator

The Inquivix Technologies Hydrogen Water Generator is engineered to meet the stringent demands of semiconductor manufacturing and high-tech industrial applications. By integrating advanced hydrogen infusion technology, our system ensures precise contamination control, superior wafer cleaning, and seamless process stability.

Below are the key technical advantages that set our hydrogen water system apart from conventional alternatives:

1. Precision Hydrogen Control for Consistent Cleaning Performance

Challenge:
Micro-contaminants on wafers can lead to electrical defects and circuit failures, impacting production yield. 


Solution: 


  • Our generator ensures a precisely controlled hydrogen concentration (1.0–2.0 ppm), optimizing wafer surface conditioning and contaminant removal.
  • Automated monitoring dynamically adjusts H₂ dosing based on real-time process requirements, eliminating manual calibration errors.

Why It Matters:
Stable hydrogen dosing ensures process reliability, reducing defects and improving semiconductor yield rates.

2. Ultra-Low Particle Filtration for High-Purity Cleaning

Challenge:
Even sub-10 nm particles can cause defects in advanced semiconductor devices, leading to electrical failures and production inefficiencies. 


Solution: 


  • Integrated multi-stage filtration maintains particle contamination levels below <10 particles @ 30 nm, ensuring cleanroom-grade ultra-pure water.
  • High-efficiency nanofiltration membranes prevent microparticle adhesion, enhancing cleaning effectiveness.

Industry Standard Compliance:
Meets and exceeds ISO 14644-1 Class 1 cleanroom purity standards, making it ideal for next-generation semiconductor nodes (3nm, 2nm, and beyond).

 3. Vacuum Degassing Technology to Eliminate Unwanted Oxidation

Challenge:
Dissolved oxygen (DO) in water can lead to unwanted oxidation, degrading wafer surfaces, and affecting CMP (Chemical Mechanical Planarization) post-cleaning processes. 


Solution: 


  • Our vacuum degassing system achieves DO levels below <1 ppb, preventing oxidation-related defects and ensuring higher process stability.
  • Optimized gas-liquid separation technology guarantees uniform hydrogen infusion without introducing excess dissolved oxygen.

Process Compatibility:
Hydrogen water with ultra-low DO levels is essential for CMP post-cleaning, etching, and thin-film deposition.

4. Modular & Scalable System Design for Semiconductor Fabs

Challenge:
Traditional hydrogen water systems lack flexibility, requiring costly customizations to fit varied fab configurations. 


Solution: 


  • Our modular system is designed for easy scalability, accommodating both small-batch and high-volume semiconductor production.
  • Plug-and-play integration with UPW (Ultra-Pure Water) pipelines allows for seamless installation without disrupting existing wet process tools.
  • Customizable flow rate and hydrogen infusion settings allow for precise adjustments based on process needs.

Scalability Benefit:
The system can be expanded without significant infrastructure modifications, reducing CAPEX for semiconductor fabs.

5. AI-Enabled Smart Monitoring for Automated Process Optimization

Challenge:
Semiconductor fabs require real-time process adjustments to maintain stable contamination control and cleaning efficiency. 


Solution: 


  • Our AI-driven monitoring system continuously tracks H₂ concentration levels, flow rates, and contamination levels, automatically optimizing settings to ensure consistent performance.
  • Remote diagnostics and predictive maintenance capabilities help minimize downtime and reduce operational disruptions.

Industry 4.0 Integration:
Supports smart factory automation, allowing fabs to integrate real-time process data into digital manufacturing ecosystems.

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Case Study: A Semiconductor Fab’s Shift to
Hydrogen Water Cleaning

To illustrate the real-world impact of hydrogen water cleaning, let’s examine how a leading semiconductor manufacturer optimized its wafer cleaning process by integrating the Inquivix Technologies Hydrogen Water Generator.

This case study highlights the challenges, implementation process, and results of transitioning from chemical-based cleaning to hydrogen water technology.

Challenge:
High Defect Rates Due to Chemical Residue & Oxidation

A major semiconductor fab specializing in sub-5nm chip production was experiencing unacceptable defect rates in its CMP post-cleaning process.

Key Issues Identified:

Unwanted Oxidation

Chemical-based cleaning agents caused oxidation on wafer surfaces, leading to irregularities in thin-film deposition.

Particle Contamination

Residual chemicals and byproducts from acidic etching processes were leaving microscopic contaminants, affecting electrical performance.

Rising Chemical Waste Costs

The fab was spending millions annually on chemical disposal, wastewater treatment, and regulatory compliance measures.

Fab’s Goal:
Reduce wafer defect rates, lower operational costs, and improve cleaning efficiency while complying with stricter environmental regulations. 


Solution:
Implementing the Inquivix Technologies Hydrogen Water Generator

The semiconductor fab partnered with Inquivix Technologies to integrate a hydrogen water cleaning system into its CMP post-cleaning and wafer rinsing processes.

  • Hydrogen-Infused Ultra-Pure Water (UPW) System – Replaced chemical-based cleaners in wafer cleaning, reducing oxidation risks.
  • Real-Time Hydrogen Concentration Monitoring – Ensured stable H₂ levels (1.0–2.0 ppm) for optimal wafer surface conditioning.
  • Ultra-Low Particle Filtration (<10 particles @ 30 nm) – Improved contaminant removal efficiency, reducing micro-defects.
  • Vacuum Degassing Technology (<1 ppb DO Levels) – Eliminated dissolved oxygen to prevent oxidation during cleaning cycles.
  • Smart AI-Driven System Optimization – Enabled automated process control, ensuring consistent hydrogen dosing across cleaning stages.

Implementation Process:
The system was integrated within 3 weeks, with no major infrastructure modifications due to its modular plug-and-play design.


Results:
Improved Yield Rates & Cost Savings in 3 Months

After implementing the Inquivix Hydrogen Water Generator, the semiconductor fab achieved significant process improvements and cost reductions.

Additional Benefits:

  • Improved Wafer Surface Uniformity – Hydrogen water eliminated residual chemical films, allowing more precise thin-film deposition.
  • Higher Chip Reliability – Defect-free wafers resulted in higher electrical performance and longer device lifespan.
  • Eco-Friendly Process – Reduced chemical waste helped the fab meet new environmental regulations ahead of schedule.

Industry Validation:

After witnessing the results, the fab expanded hydrogen water usage to additional etching, stripping, and photolithography cleaning stages, further optimizing overall process efficiency.

Cleaner Wafers, Better Yield, Sustainable Solutions 

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Why Inquivix Technologies?

As the semiconductor industry moves toward smaller nodes, stricter contamination control, and more sustainable manufacturing, choosing the right hydrogen water generator is crucial. Inquivix Technologies stands out as a trusted supplier in the field of functional water and gas solutions, offering cutting-edge hydrogen water technology designed for high-purity semiconductor and industrial applications.

Here’s why leading semiconductor fabs, industrial manufacturers, and research facilities choose Inquivix Technologies:

1. Industry-Leading Functional Water Expertise

With extensive experience in ultra-pure water treatment and hydrogen water technology, Inquivix Technologies provides specialized solutions for:

  • Semiconductor manufacturing – Wafer cleaning, oxidation control, and contamination removal.
  • CMP post-cleaning and etching – Ensuring higher wafer yield and surface integrity.
  • Medical and pharmaceutical applications – Sterile, high-purity hydrogen water solutions.
  • Advanced industrial cleaning – Supporting aerospace, optics, and precision manufacturing industries.

Our focus on functional water and gas systems ensures that clients receive highly specialized, industry-specific solutions.

2. Global Supplier of Hydrogen & Ozone Systems

Unlike generic industrial suppliers, Inquivix Technologies specializes in hydrogen and ozone water generation systems, offering:

  • Custom-designed hydrogen water systems tailored for high-tech manufacturing needs.
  • Seamless integration with existing ultra-pure water (UPW) pipelines in semiconductor fabs.
  • Flexible system scalability for both small-batch and high-volume production environments.

We don’t just sell equipment—we provide engineered solutions that optimize manufacturing efficiency and contamination control.

3. Reliable & Scalable Solutions for High-Volume Production

  • Modular system design allows for easy expansion based on fab size and production volume.
  • Plug-and-play integration minimizes downtime during installation.
  • Smart automation technology ensures consistent hydrogen dosing and process control.

Our hydrogen water generators are engineered for reliability in high-throughput semiconductor fabs, ensuring uninterrupted cleaning efficiency and contamination control.

4. Cutting-Edge Korean Engineering & Innovation

  • Designed and manufactured in Korea, leveraging the country’s advanced semiconductor industry expertise.
  • Built with high-precision materials and filtration technology to ensure consistent ultra-pure hydrogen water output.
  • Features AI-driven process monitoring, optimizing real-time hydrogen concentration levels.

Korean engineering excellence has made Inquivix Technologies a trusted partner for semiconductor manufacturers worldwide.

5. Unmatched Customer Support & Technical Consultation

  • End-to-end technical support – From system selection to post-installation optimization.
  • On-site and remote diagnostic services to ensure continuous process efficiency.
  • Process customization and integration consulting for fabs with specific contamination control requirements.

We don’t just provide equipment—we work alongside our clients to ensure they achieve the best contamination control results possible.

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Frequently Asked Questions (FAQ) About Hydrogen
Water Generators

To help you better understand how hydrogen water technology benefits semiconductor manufacturing and industrial applications, we’ve compiled answers to some of the most commonly asked questions.

What is the ideal concentration of hydrogen in semiconductor cleaning processes?

The optimal hydrogen concentration for wafer cleaning typically falls within the range of 1.0–2.0 ppm. This ensures effective contaminant removal while maintaining wafer surface integrity without causing unwanted oxidation or reactions.

Semiconductor fabs fine-tune hydrogen concentrations depending on their specific wafer cleaning, etching, or passivation needs.

Can the hydrogen water generator integrate with existing ultra-pure water (UPW) lines?

Yes, our hydrogen water generator is designed for seamless integration with standard UPW pipelines used in semiconductor fabs. It operates within closed-loop systems, ensuring stable hydrogen infusion without requiring major infrastructure modifications.

Our modular design allows for direct connection to existing wet processing, CMP cleaning, and surface treatment stations.

How does hydrogen water compare to ozone water for wafer cleaning?

Both hydrogen water and ozone water play essential roles in wafer cleaning, but they serve different

Many fabs use a combination of hydrogen water and ozone water to maximize cleaning effectiveness while minimizing contamination risks.

What maintenance is required for the hydrogen water generator?

Our hydrogen water generators require minimal maintenance due to their self-cleaning filtration system and automated monitoring technology. However, periodic inspection and calibration of hydrogen dosing levels is recommended to ensure optimal performance.

Standard Maintenance Schedule:
✔ Quarterly system check-ups for flow rate consistency.
✔ Annual filtration replacement to maintain ultra-low particle contamination levels.
✔ Automated diagnostics ensure real-time hydrogen level adjustments, reducing manual intervention.

Is hydrogen water cleaning more cost-effective than traditional chemical-based methods?

Yes, hydrogen water cleaning offers significant cost savings over traditional chemical-based wafer cleaning due to:

✔ Lower consumable costs – Eliminates the need for acidic and alkaline chemical cleaning agents.
✔ Reduced waste disposal fees – No hazardous chemical byproducts requiring costly treatment.
✔ Extended equipment lifespan – Prevents corrosion and damage caused by aggressive chemical cleaners.

Semiconductor fabs switching to hydrogen water typically see a 30-50% reduction in chemical waste management costs while improving wafer yield rates.

How does hydrogen water contribute to sustainability in semiconductor fabs?

Hydrogen water cleaning aligns with global sustainability initiatives by:

✅ Reducing reliance on hazardous chemicals, making fabs more eco-friendly.
✅ Lowering energy consumption, as it requires less processing compared to conventional chemical cleaning.
✅ Minimizing water waste, since it operates within closed-loop ultra-pure water systems.

Semiconductor fabs implementing hydrogen water technology comply with stricter environmental regulations, reducing their carbon footprint and improving ESG (Environmental, Social, and Governance) performance.

Get a Custom Quote for Our Hydrogen Water Generator

The Inquivix Technologies Hydrogen Water Generator is the optimal choice for advanced wafer cleaning and surface passivation as semiconductor manufacturing moves toward higher precision, stricter contamination control, and greener solutions. Our cutting-edge hydrogen water technology ensures higher yield rates, lower defect rates, and reduced operational costs for high-tech fabs and industrial applications.

Ready to optimize your wafer cleaning process with high-purity hydrogen water?

Customized Solutions
Tailored to your fab’s specific ultra-pure water (UPW) system.

Expert Consultation
Speak with our specialists to determine the best hydrogen water setup for your process.

Seamless Integration
Our team ensures easy adoption with existing semiconductor wet processing tools.

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